中文簡介

《等離子體化學與等離子體處理》是一份國際期刊，為發表有關等離子體化學與等離子體處理的基礎研究和新進展的原始論文提供了一個論壇。該雜志涵蓋了所有類型的工業加工等離子體，從非熱等離子體到熱等離子體，并出版了基礎等離子體研究以及特定等離子體應用的研究。感興趣的應用領域包括微電子和其他領域的等離子體蝕刻、薄膜和涂層的沉積、粉末合成、環境處理、照明、表面改性等。包括等離子體的化學動力學研究，以及等離子體與表面的相互作用。

　　英文簡介

Plasma Chemistry and Plasma Processing is an international journal that provides a forum for the publication of original papers on fundamental research and new developments in plasma chemistry and plasma processing. The journal encompasses all types of industrial processing plasmas, ranging from nonthermal plasmas to thermal plasmas, and publishes fundamental plasma studies as well as studies of specific plasma applications. Application contexts of interest include plasma etching in microelectronics and other fields, deposition of thin films and coatings, powder synthesis, environmental processing, lighting, surface modification and others. Includes studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces.

　　近年期刊自引率趨勢圖

　　JCR分區

JCR分區等級	JCR所屬學科	分區	影響因子
Q2	PHYSICS, FLUIDS & PLASMAS	Q2	3.337
	PHYSICS, APPLIED	Q2
	ENGINEERING, CHEMICAL	Q2

　　近年期刊影響因子趨勢圖

　　CiteScore數值

CiteScore	SJR	SNIP	學科類別	分區	排名	百分位
5.40	0.549	1.120	大類：Materials Science 小類：Surfaces, Coatings and Films	Q1	30 / 129	77%
			大類：Materials Science 小類：General Chemical Engineering	Q1	70 / 280	75%
			大類：Materials Science 小類：Condensed Matter Physics	Q2	106 / 415	74%
			大類：Materials Science 小類：General Chemistry	Q2	110 / 409	73%

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