中文簡介

等離子體源科學和技術報告在所有壓力和密度范圍內運行的非聚變等離子體源，包括中性和非中性等離子體源；正負離子源；自由基源；微波、射頻、直流電、激光和電子束激發源；共振源；蝕刻、沉積、聚合、燒結用等離子體；加速器用等離子體源；照明應用；醫學物理用等離子體源；激光用等離子體源；其他應用，如航天器推進器；工業電弧熔化；低壓等離子體源：分布函數；激輻射平衡；振動激勵；質量、動量和能量傳輸；離子注入。中低壓等離子體源：等離子體表面相互作用；高壓源；熱等離子體；等離子體診斷技術；等離子體和等離子體源建模。

　　英文簡介

Plasma Sources Science and Technology reports on non-fusion plasma sources which operate at all ranges of pressure and density including neutral and non-neutral plasma sources; positive and negative ion sources; free radical sources; microwave, RF, direct current, laser and electron beam excited sources; resonant sources; plasmas for etching, deposition, polymerization, sintering; plasma sources for accelerators; lighting applications; plasma sources for medical physics; plasma sources for lasers; other applications, e.g. spacecraft thrusters; industrial arc melting; plasmas as sources of UV and x-ray radiation; plasma source design, monitoring and control; source stability and reproducibility. Low-pressure plasma sources: distribution functions; excitation-radiation equilibria; vibrational excitation; mass, momentum and energy transport; ion implantation. Low-to-medium pressure plasma sources: plasma surface interactions; high pressure sources; thermal plasmas; plasma diagnostic techniques; plasma and plasma source modelling.

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